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中国物理学会期刊

宽禁带大功率电子器件结温测量技术

CSTR:32037.14.aps.75.20260106

Wide bandgap high power electronic device junction temperature measurement technology

CSTR:32037.14.aps.75.20260106
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  • 基于氮化镓(GaN)、碳化硅(SiC)以及氧化镓(Ga2O3)等材料的宽禁带大功率电子器件, 凭借其卓越的功率密度和高频性能已广泛应用于功率电子和射频领域. 然而, 高功率密度所引发的强烈自热效应, 导致器件结温显著升高, 成为制约器件可靠性的关键挑战. 为优化散热设计以及预测器件寿命, 针对宽禁带半导体器件的结温提取与测量尤为重要. 因此, 本文综述了当前宽禁带半导体器件结温测量领域的主流技术, 包括电学法、物理接触法及光学法三大类, 并从基本原理、技术实现、测量精度及时空分辨率等多维度进行全面比较与深入评析. 在电学法方面, 主要介绍了基于温度敏感参数的测量原理与流程. 在物理接触方法领域, 系统梳理了扫描热显微镜以及温度传感器等技术的测量方式. 针对光学测量方法, 详细探讨了红外热成像、拉曼与热反射等非接触式技术的应用原理与特点. 通过量化比较不同结温测量方法, 为工程师和研究者在不同应用场景下选择合适的技术提供了具体指导. 最后, 总结了宽禁带半导体器件结温测量面临的未来挑战, 并展望了多技术融合、新型探测方法带来的机遇.

    Wide-bandgap semiconductor power devices based on materials such as gallium nitride (GaN), silicon carbide (SiC), and gallium oxide (Ga2O3) have gained widespread adoption in power electronics and radio-frequency systems, owing to their high critical electric field, elevated power density, and superior high-frequency performance. However, under high power density operating conditions, power devices experience significant self-heating, which raises the junction temperature and consequently degrades both performance and reliability. Accurate extraction and measurement of the junction temperature are therefore essential for elucidating heat generation mechanisms, optimizing thermal management designs, and enabling reliable lifetime predictions. This review provides a systematic review of the mainstream techniques for junction temperature measurement in wide-bandgap semiconductor devices, categorized into three primary classes: electrical methods, physical contact methods, and optical methods. For electrical methods, the principles underlying temperature-sensitive parameters are introduced, along with their capability for online monitoring. These approaches are particularly well suited for real-time temperature assessment in packaged devices. For physical contact methods, the implementation and measurement principles of techniques such as scanning thermal microscopy and on-chip integrated temperature sensors are evaluated. For optical methods, the principles and application scenarios of non-contact temperature measurement techniques, including infrared thermography, micro-Raman spectroscopy, and thermoreflectance, are analyzed in detail. Finally, the review discusses key challenges currently confronting junction temperature measurements in wide-bandgap devices, including the characterization of ultrafast transient thermal processes, three-dimensional mapping of embedded thermal distributions, and mitigation of strong interference from multiphysics-coupled signals. Prospects for future development are also outlined, encompassing multi-technique fusion approaches, novel deep thermal characterization methods, and the emergence of quantum-precision temperature sensing technologies.

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