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中国物理学会期刊

三层α-Te/InSe/γ-Te范德华异质结电子结构和光学特性的外场调控

External field controllable electronic structure and optical properties of the three layer α-Te/InSe/γ-Te Van der Waals heterojunctions

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  • 基于密度泛函理论(DFT)的第一性原理计算方法,系统研究InSe半导体单层插入α-Te/γ-Te异质结中形成三层范德华异质结α-Te/InSe/γ-Te的几何结构、界面特性、光学性质及其应变和电场调控。研究结果表明,InSe半导体插层可以显著减弱α-Te和γ-Te单层之间的杂化相互作用。基态下三层α-Te/InSe/γ-Te范德华异质结属于典型的n型肖特基接触,并形成0.16 eV的势垒。正向电场作用下,三层α-Te/InSe/γ-Te范德华异质结可以从n型肖特基接触转变为p型肖特基接触或欧姆接触;负向电场作用下,三层α-Te/InSe/γ-Te范德华异质结可以实现从n型肖特基接触到欧姆接触的转变。三层α-Te/InSe/γ-Te范德华异质结在双轴压缩应变作用下势垒高度降低,并可实现从n型肖特基接触向p型肖特基接触转变。三层α-Te/InSe/γ-Te范德华异质结的最大光吸收系数高达32%并受到双轴应变的有效调控,在电场作用下最大光吸收系数可达39%。以上研究结果可为基于三层α-Te/InSe/γ-Te范德华异质结的新型纳米电子/光电子器件设计与应用提供理论参考。

    Vertically stacking two or more two-dimensional single-layer materials has been proven to be one of the most commonly used strategies in constructing van der Waals heterostructures for enhancing the electronic, optical, and photocatalytic properties of the two-dimensional materials. Based on the first-principles calculation method combining the density functional theory (DFT), this paper systematically investigates the geometric structure, interface characteristics, optical properties, strain and electric field controllable three-layer van der Waals heterojunction α-Te/InSe/γ-Te formed by single-layer insertion of the InSe semiconductor into α-Te/γ-Te heterojunction. The research results indicate that the InSe semiconductor intercalation method can significantly reduce the hybridization interaction between the α-Te and γ-Te monolayers. The ground state of the three-layer α-Te/InSe/γ-Te van der Waals heterojunction belongs to a typical n-type Schottky contact and forms a potential barrier of 0.16 eV. Under the action of a positive electric field, the three-layer α-Te/InSe/γ-Te van der Waals heterojunction may transform from an n-type Schottky contact to a p-type Schottky contact or an ohmic contact. Under the action of a negative electric field, the three-layer α-Te/InSe/γ-Te van der Waals heterojunction should transit from n-type Schottky contact to ohmic contact. The three-layer α-Te/InSe/γ-Te van der Waals heterojunction would transit from n-type Schottky contact to p-type Schottky contact under the biaxial compressive strain, and the interface barrier height decreases with the biaxial tensile strain. The maximum absorption coefficient of the three-layer α-Te/InSe/γ-Te van der Waals heterojunction is as high as 32%, as may be effectively manipulated by the external biaxial strain. Under the action of an electric field, the maximum absorption coefficient may reach 39%. The demonstrated results can provide theoretical references for the design and application of the novel nanoelectronic/optoelectronic devices based on three-layer α-Te/InSe/γ-Te van der Waals heterojunctions.

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