Monolithic formation of heat dissipation microchannel on silicon wafer via epitaxial growth

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ZHOU Xinyu; WEI Wenqi; MING Ming; LIU Fangze; ZHANG Jianjun

doi:10.7498/aps.75.20260243

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ZHOU Xinyu, WEI Wenqi, MING Ming, LIU Fangze, ZHANG Jianjun. Monolithic formation of heat dissipation microchannel on silicon wafer via epitaxial growth. Acta Physica Sinica, 2026, 75(13): 130707. DOI: 10.7498/aps.75.20260243

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ZHOU Xinyu, WEI Wenqi, MING Ming, LIU Fangze, ZHANG Jianjun. Monolithic formation of heat dissipation microchannel on silicon wafer via epitaxial growth. Acta Physica Sinica, 2026, 75(13): 130707. DOI: 10.7498/aps.75.20260243

Citation:

ZHOU Xinyu, WEI Wenqi, MING Ming, LIU Fangze, ZHANG Jianjun. Monolithic formation of heat dissipation microchannel on silicon wafer via epitaxial growth. Acta Physica Sinica, 2026, 75(13): 130707. DOI: 10.7498/aps.75.20260243