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    施一生, 赵特秀, 刘洪图, 王晓平

    A STUDY ON ELECTRICAL RESISTIVITY OF RF SPUTTERING Pd FILMS

    SHI YI-SHENG, ZHAO TE-XIU, LIU HONG-TU, WANG XIAO-PING
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    • 本文研究了溅射Pd薄膜的电阻率与膜厚关系和不同溅射功率下Pd薄膜电阻率,结果表明,电阻率与膜厚的关系与现有的薄膜电阻率尺寸效应的理论基本相符,存在的差异主要是由溅射对衬底温度影响而引起的,并显示玻璃衬底上生长膜也有择优取向,溅射功率的变化对电阻率有一定的影响,进一步讨论溅射过程中衬底温度变化的问题,得出膜电阻率随衬底温度变化的定量关系式。
      In this paper, we report the study of the dependence of electrical resistivities of sputtering Pd films on their thicknesses and electrical resistivities of sputtering Pd films under different sputtering power. The results show that there is a small diversity between the latter theory of "size effects" and results of the thickness dependence of electrical resistivity. This diversity is due to effect of temperatures of the substrates. It shows that there is optimization during depositing on glass, and sputtering power would af fecth the electrical resistivity. After discussing the problem of substrate temperatures, we obtained a quantitative formula for the substrate temperature dependence of electrical resistivity.
        • 基金项目:中国科学技术大学结构分析开放实验室基金资助的课题
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      • 收稿日期:1989-12-25
      • 刊出日期:2005-03-20

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