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王飞, 刘望, 邓爱红, 朱敬军, 安竹, 汪渊

Interface effects on helium retention properties of ZrN/TaN nano-multilayers

Wang Fei, Liu Wang, Deng Ai-Hong, Zhu Jing-Jun, An Zhu, Wang Yuan
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  • 采用射频磁控溅射方法, 在混合气氛下制备了ZrN/TaN多层膜. 利用X射线衍射、慢正电子束分析、增强质子背散射、扫描电子显微镜, 分别对ZrN/TaN多层膜中相结构、氦相关缺陷、氦含量、截面形貌等进行了分析. 结果表明, 调制周期为30 nm的ZrN/TaN多层膜在600℃退火后, 氦的保持率仍能达到45.6%. 在适当的调制周期下, ZrN/TaN多层膜能够耐氦损伤并且其界面具有一定的固氦性能.
    In this paper, ZrN/TaN nano-multilayers are fabricated in mixing atmosphere by radio frequency magnetron sputtering. The phase structures, He-related defects, helium content and cross-section morphologies of ZrN/TaN nano-multilayers are characterized by X-ray diffraction, slow positron beam analysis, enhanced proton backscattering spectrome and scanning electron microscope, respectively. The results show that the interface of ZrN/TaN nano-multilayer with 30 nm modulation period is stable and could resist the damage of helium even annealed at 600℃. The He retention rate of ZrN/TaN nano-multilayer with 30 nm modulation period can reach up to 45.6%.
      • 基金项目:国家自然科学基金(批准号:51171124,11275132);四川省科技支撑计划基金(批准号:07FG001-017)和教育部新世纪人才基金(批准号:NCET-08-0380)资助的课题.
      • Funds:Project supported by the National Natural Science Foundation of China (Grant Nos. 51171124, 11275132), the Scientific and Technical Supporting Programs of SCST, China (Grant No. 07FG001-017), the Program for New Century Excellent Talents in University, China (Grant No. NCET-08-0380).
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    出版历程
    • 收稿日期:2013-04-28
    • 修回日期:2013-06-03
    • 刊出日期:2013-09-05

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