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Abstract

Graphene synthesis by chemical-vapor-deposition (CVD) has attracted great interest. As the substrates for graphene growth, copper has become a common choice because its capacity could produce high-quality and uniform monolayer graphene. Morphology and surface conditions of the copper foil have great influence on the quality of the graphene grown on it. Here we report a rapid and effective copper pre-treatment method to improve the quality of graphene. After a pre-etching in 1 mol/L Fe(NO3)3 aqueous solutions for 90 s, the quality of the copper foil surface has been improved. Compared with the HCl treatment and electro-chemical polishing, Fe(NO3)3 pre-etching can generate a better result and has been verified to have general applicability for different types of copper foils.

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Funds:Project supported by the National Basic Research Program of China (Grant No. 2011CB013100), and the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (Grant No. 2011BAE01B14).

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Vol. 63, Issue 17 - 2014-09-05

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